PVD Systems

Physical vapor deposition platforms for research and production — from compact benchtop evaporators to large-chamber multi-source sputtering systems.

Understanding PVD Sputtering

Physical Vapor Deposition (PVD) sputtering is a vacuum-based thin film deposition technique...

High Purity Ultra-clean vacuum environment ensures contamination-free films
Precise Control Angstrom-level thickness control with real-time monitoring
Versatile Materials Deposit metals, oxides, nitrides, and multi-layer stacks
Low Temperature Room-temperature to moderate heating — compatible with sensitive substrates
PVD Technology
15+ Systems Available
3 Leading Suppliers
2"–500mm Substrate Range
7 products in this category
Product Angstrom Engineering

Covap

Compact Thermal Evaporation PVD Platform

  • Deposition: Thermal evaporation
  • Sources: 2–4 configurable
  • Chamber: Hinged lid design

Compare Products in This Category

Model Deposition Method Chamber Size Key Feature Supplier
Covap Thermal Evaporation Compact Hinged lid, glovebox-ready Angstrom Inquire

Industries & Applications

Semiconductor

Metallization, barrier layers, and interconnects for IC fabrication.

Frequently Asked Questions

Common questions about PVD sputtering systems — answered by our engineers.

DC sputtering works with conductive targets...

Technical Resources & Downloads

Need Help Selecting the Right System?

Our technical team can recommend the best solution for your application requirements, budget, and timeline.